Symposium
| Date | Hours | Room | Related Category |
|---|---|---|---|
| Symporsium Title | |||
| 9/5 (Tue.) |
14:30～17:00 | C24 |
1.Interdisciplinary Physics and Related Areas of Science and Technology |
| 13:00～16:00 | A402 |
3.Optics and Photonics |
|
| 9:00～17:30 | Ａ405 |
6.Thin Films and SurfacesMaterials Nano-technology: Surfaces and Interfaces of Thin Films and Nano-composites |
|
| 13:15～18:30 | A203 |
12.Organic Molecules and BioelectronicsNew Trend: Interdisciplinary approach to link biological materials and advanced device applications |
|
| 13:15～17:15 | C19 |
12.Organic Molecules and Bioelectronics |
|
| 13:15～16:45 | C16 |
13.SemiconductorsAdvances and future prospects of luminescent devices based on new material and quantum structure |
|
| 9:30～17:15 | S21 |
13.Semiconductors |
|
| 13:30～17:45 | A204 |
15.Crystal Engineering |
|
| 9/6
(Wed.) |
13:30～17:30 | S21 |
2.Ionizing Radiation |
| 13:15～17:15 | A411 |
3.Optics and Photonics |
|
| 13:30～17:30 | A202 |
6.Thin Films and SurfacesTerahertz optical properties of oxides and the perspective for device applications |
|
| 13:45～17:30 | C19 |
6.Thin Films and Surfaces 13.SemiconductorsNanoscale 3D analyses for new device and materials development |
|
| 13:30～17:30 | S22 |
8.Plasma Electronics |
|
| 13:15～ 17:00 | C18 |
10.Spintronics and Magnetics |
|
| 13:00～16:30 | A301 |
15.Crystal Engineering |
|
| 13:45～19:15 | C16 |
17.Nanocarbon TechnologyLatest Application Researches and Future Prospects of Functional Atomic Layers |
|
| 9/7 (Thu.) |
13:45～17:05 | A502 |
12.Organic Molecules and Bioelectronics |
| 13:45～17:25 | C19 |
13.SemiconductorsChallenges for‘multi-scale’ processing ― dry, wet, or else?… |
|
| 13:30～18:30 | C18 |
13.SemiconductorsFilm Formation and Low Temperature of IV Element Semiconductor |
|
| 13:45～18:00 | C13 |
13.Semiconductors |
|
| 13:30～17:30 | A201 |
15.Crystal Engineering |
|
| 9/8
(Fri.) |
9:00～15:15 | A203 |
15.Crystal EngineeringIII-V semiconductor growth technology for innovative devices |
| 12:45～17:00 | A204 |
Joint Session KGallium Oxide : Novel Wide Band-Gap Oxide Material for Future Generation |